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ISO 17331:2004Published

Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

Analyse chimique des surfaces — Méthodes chimiques pour collecter les éléments analysés de tranches de silicium comme matériaux de référence pour l'analyse par spectroscopie de fluorescence X en réflexion totale (TXRF)

Abstract / scope

ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method.

It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.

Life cycle

Amendments & corrigenda

ISO 17331:2004/Amd 1:2010PublishedSurface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1International Standard · Published 5 Jul 2010 · ISO/TC 201