Practice for dosimetry in an electron beam facility for radiation processing at energies between 80 and 300 keV

ISO 51818:20090 applies to dosimetric procedures to determine the performance of low-energy (300 keV or less) single-gap electron-beam radiation processing facilities.

Other practices and procedures related to facility characterization, process qualification and routine processing are also discussed.

The electron-energy range covered in ISO 51538:2009 is from 80 keV to 300 keV. Such electron beams can be generated by single-gap self-contained thermal filament or plasma-source accelerators.