ISO 21859:2019Published

Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

Céramiques techniques — Méthode d’essai pour déterminer la résistance au plasma des composants céramiques dans les équipements de production à semi-conducteurs

Abstract / scope

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.