Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.

This document is not intended to cover the use of special multilayered systems such as delta doped layers.