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ISO 14976:1998PublishedSurface chemical analysis — Data transfer formatISO/TS 15338:2025PublishedSurface chemical analysis — Glow discharge mass spectrometry — Operating proceduresISO 15470:2017PublishedSurface chemical analysis — X-ray photoelectron spectroscopy — Description of selected instrumental performance parametersISO 15471:2016PublishedSurface chemical analysis — Auger electron spectroscopy — Description of selected instrumental performance parametersISO 15472:2010PublishedSurface chemical analysis — X-ray photoelectron spectrometers — Calibration of energy scalesISO 15796:2005PublishedGas analysis — Investigation and treatment of analytical biasISO/TR 15969:2021PublishedSurface chemical analysis — Depth profiling — Measurement of sputtered depthISO 16129:2018PublishedSurface chemical analysis — X-ray photoelectron spectroscopy — Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometerISO 16242:2011PublishedSurface chemical analysis — Recording and reporting data in Auger electron spectroscopy (AES)ISO 16243:2011PublishedSurface chemical analysis — Recording and reporting data in X-ray photoelectron spectroscopy (XPS)ISO/TR 16268:2009PublishedSurface chemical analysis — Proposed procedure for certifying the retained areic dose in a working reference material produced by ion implantationISO 16413:2020PublishedEvaluation of thickness, density and interface width of thin films by X-ray reflectometry — Instrumental requirements, alignment and positioning, data collection, data analysis and reportingISO 16531:2020PublishedSurface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPSISO 16664:2017PublishedGas analysis — Handling of calibration gases and gas mixtures — GuidelinesISO 16666:2025PublishedSurface chemical analysis — Total reflection X-ray fluorescence — Principles and general requirementsISO 16962:2017PublishedSurface chemical analysis — Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometryISO 17109:2022PublishedSurface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin filmsISO 17331:2004PublishedSurface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopyISO 17560:2014PublishedSurface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in siliconISO 17862:2022PublishedSurface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysersISO 17973:2024PublishedSurface chemical analysis — Medium-resolution Auger electron spectrometers — Calibration of energy scales for elemental analysisISO 17974:2002PublishedSurface chemical analysis — High-resolution Auger electron spectrometers — Calibration of energy scales for elemental and chemical-state analysisISO 18114:2021PublishedSurface chemical analysis — Secondary-ion mass spectrometry — Determination of relative sensitivity factors from ion-implanted reference materialsISO 18115-1:2023PublishedSurface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopyISO 18115-3:2022PublishedSurface chemical analysis — Vocabulary — Part 3: Terms used in optical interface analysis