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ISO 13084:2018WithdrawnSurface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometerISO 13084:2011WithdrawnSurface chemical analysis — Secondary-ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometerISO/TS 14167:2003WithdrawnGas analysis — General quality assurance aspects in the use of calibration gas mixtures - GuidelinesISO/TR 14187:2011WithdrawnSurface chemical analysis — Characterization of nanostructured materialsISO 14237:2000WithdrawnSurface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materialsISO 14606:2015WithdrawnSurface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materialsISO 14606:2000WithdrawnSurface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materialsISO 14701:2011WithdrawnSurface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thicknessISO 14706:2000WithdrawnSurface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopyISO 14707:2015WithdrawnSurface chemical analysis — Glow discharge optical emission spectrometry (GD-OES) — Introduction to useISO 14707:2000WithdrawnSurface chemical analysis — Glow discharge optical emission spectrometry (GD-OES) — Introduction to useISO 14912:2003WithdrawnGas analysis — Conversion of gas mixture composition dataISO/TS 15338:2020WithdrawnSurface chemical analysis — Glow discharge mass spectrometry — Operating proceduresISO/TS 15338:2009WithdrawnSurface chemical analysis — Glow discharge mass spectrometry (GD-MS) — Introduction to useISO 15470:2004WithdrawnSurface chemical analysis — X-ray photoelectron spectroscopy — Description of selected instrumental performance parametersISO 15471:2004WithdrawnSurface chemical analysis — Auger electron spectroscopy — Description of selected instrumental performance parametersISO 15472:2001WithdrawnSurface chemical analysis — X-ray photoelectron spectrometers — Calibration of energy scalesISO/TR 15969:2001WithdrawnSurface chemical analysis — Depth profiling — Measurement of sputtered depthISO 16129:2012WithdrawnSurface chemical analysis — X-ray photoelectron spectroscopy — Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometerISO 16413:2013WithdrawnEvaluation of thickness, density and interface width of thin films by X-ray reflectometry — Instrumental requirements, alignment and positioning, data collection, data analysis and reportingISO 16531:2013WithdrawnSurface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPSISO 16664:2004WithdrawnGas analysis — Handling of calibration gases and gas mixtures — GuidelinesISO 16962:2005WithdrawnSurface chemical analysis — Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometryISO 17109:2015WithdrawnSurface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin filmsISO 17560:2002WithdrawnSurface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon